Transsphenoidal Sellar Implant
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Designed with Murali Guthikonda, M. D., F.A.C.S., and John Jane, Jr., M.D.
The MEDPOR Transsphenoidal Sellar Implant (TSI™) is designed to repair
the sellar floor following a pituitary tumor resection.
The TSI Implant is now available in two sizes and configurations. The
new, larger TSI is designed with three small tabs to facilitate handling
and placement, while the original TSI design has a single tab.
A nonporous sheet of polyethylene heat bonded to the posterior surface of the new, larger TSI forms a BARRIER to aid in preventing tissue ingrowth.
- The implant is easily cut with a variety of surgical instruments.
- The firm nature of the material allows carving with a sharp instrument without collapsing the pore structure.
- The new larger TSI has a BARRIER™ surface on the side facing the dura making the implant a bit stiffer, which could provide extra support for a fat graft
- The new larger TSI may be appropriate for larger openings in the sella or “extended approaches”
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Catalog No.
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Description
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A x B x C X D
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82007
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Transsphenoidal Sellar Implant
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20mm x 20mm x 2.5mm x 0.45mm
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82008
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TSI BARRIER™ – Large
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40mm x 40mm x 2.5mm x 0.73mm
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